Study on light trapping ability of double-textured ZnO:Al films by one-step etching

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Important Dates

Conference:

Apr. 22-24, 2019

Full Paper Due: Mar. 18, 2019

Abstract Due: Mar. 18, 2019

Audience Registration Due:
Apr. 22, 2019

Presentations of The Spring World Congress on Engineering and Technology (SCET 2017)

● Study on light trapping ability of double-textured ZnO:Al films by one-step etching
Author(s)
Ying Wang
Affiliation(s)
School of Science, University of Science and Technology Liaoning
KEYWORDS
light trapping ability, double-textured ZnO:Al films, one-step etching
ABSTRACT
Double-textured ZnO:Al (AZO) transparent conducting films with good optoelectronic properties and improved light trapping ability were prepared by a method of only one-step etching process. The effects of Ar flow rate, working pressure and substrate temperature on the structural, optoelectronic properties, surface morphology and light trapping ability of double-textured AZO films were investigated. The light trapping ability of double-textured films were improved obviously compared with that of single-textured films. The double-textured AZO films prepared by this one-step etching method have potential application as front electrodes in solar cells.